Gamma Induced Structural and Optical Changes of TiO2 Thin Film Deposited by Atomic Layer Deposition
/The thin films of 100 nm thickness titanium dioxide (TiO2) were deposited on the glass substrate by using atomic layer deposition (ALD). The influence of the gamma () irradiation on structural and optical properties of nanostructural TiO2 films was studied. The samples were irradiated with 60Co source from 25–100 kGy. The X-ray diffraction and photoluminescence study confirmed the changes in the crystallinity after irradiation. The optical results were done by UV-vis-spectrophotometer and diffuse reflectance. It is observed that the optical band gap value of TiO2 thin films decreases with increasing gamma dose.
Publication Work Type
/research
Publisher Name
/American Scientific Publishers
Volume Number
/Vol. 13
Magazine \ Newspaper
/Journal of Nanoelectronics and Optoelectronics
Pages
/pp. 1701–1704
Accepted in: Journal of Materials Science: Materials in Electronics (JMSE)
J Mater Sci: Mater Electron (2022) 33:18982–18990
Journal of King Saud University – Science 34 (2022) 101802