Gamma Induced Structural and Optical Changes of TiO2 Thin Film Deposited by Atomic Layer Deposition

مقال فى مجلة

2018

تم النشر فى: /www.aspbs.com/jno

/The thin films of 100 nm thickness titanium dioxide (TiO2) were deposited on the glass substrate by using atomic layer deposition (ALD). The influence of the gamma () irradiation on structural and optical properties of nanostructural TiO2 films was studied. The samples were irradiated with 60Co source from 25–100 kGy. The X-ray diffraction and photoluminescence study confirmed the changes in the crystallinity after irradiation. The optical results were done by UV-vis-spectrophotometer and diffuse reflectance. It is observed that the optical band gap value of TiO2 thin films decreases with increasing gamma dose.

• نوع عمل المنشور: /research
• اسم الناشر: /American Scientific Publishers
• رقم المجلد: /Vol. 13
• مجلة/صحيفة: /Journal of Nanoelectronics and Optoelectronics
• الصفحات: /pp. 1701–1704