Introduction to microelectronic processing, chlorosilanes from metallurgical grade silicon, bulk crystal growth from melts, chemical vapor deposition (CVD), low pressure chemical vapor deposition (LCVD), thermal laser assisted CVD, photochemical CVD, CVD in optical fiber fabrication, glow discharge (plasma) characteristics, plasma reactors, liquid phase epitaxy (LPE), physical vapor deposition (PVD), catalytic and non-catalytic etching. Oxidation of silicon.